TAZMO Wafer Aligner 300MM For Compound and Glass Wafer MAF-V

Model:MAF-V
Handling object: 300mm SEMl standard wafer
Alignment time:10.5 seconds or less
Alignment accuracy:T=±0.3deg

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TAZMO Wafer Aligner 300MM For Compound and Glass Wafer MAF-V

Model:MAF-V
Handling object: 300mm SEMl standard wafer
Alignment time:10.5 seconds or less
Alignment accuracy:T=±0.3deg

SKU wafer aligner 300mm Category

TAZMO Wafer Aligner 300MM For Compound and Glass Wafer

 

Data Sheet

Product Pre-Aligner Edge hold
Model MAF-V
Handling object 300mm SEMl standard wafer

(Please inguire with regard tospecial wafer)

Alignment time 10.5 seconds or less(21 seconds or less when separate chucking required)
Alignment accuracy T=±0.3deg
Wafer off-center limit ±1mm or less(wafer offset from chuck center)
Wafer holding method Drop-in + end fac econtact retention

(clamp wafer by stroke end)

Wafer hold check Limited reflective fiber sensor(2 locations)
Network Protocol RS232C
Power source 24V DC±10%, 5A, 1-line

Customization:

Elevator mechanism Z:Yes
N:None
Chuck material P:PPS
K:PEEK
Z:Custom
Work size H:300mm
J: 200mm
K:150mm
Sensor type & chuck method V:CCD receptor(Drop-in+end facecontact retention) [Glass and compound wafer]