SRD Spin Rinse Dryer 4in

SRD Spin Rinse Dryer 4in
- Model Number: XWS-602D-4
- Max Speed of spin: Up to 2,800rpm
- With N2 continuous purge. N2 flow can be heated up to 70C
- With DIW Resistance meter
- With Anti-Static Device. With N2 Low flow interlock
Ask For Price!
Spin Rinse Dryers are designed to remove residual chemicals and particles from wafers while ensuring they are completely dried without leaving water spots. The process typically involves:
Rinsing: Wafers are rinsed with deionized (DI) water to remove any chemical residues or particles.
Drying: The wafers are spun at high speeds (up to 10,000 rpm) while heated nitrogen gas (N2) is injected into the chamber to evaporate moisture quickly and efficiently.
Please check below the data sheet chart of our product:
Technical Data Sheet
Model No. | XWS-602D-4 |
Basic Function | DIW Rinse,Pipe Purge,Spin Dry,Hot N2. |
Max Speed of spin | Up to 2,800rpm |
N2 heating | 70℃ |
With N2 continuous purge | Yes |
DIW Resistance meter | Yes |
Anti-Static Device/N2 Low flow interlock | Yes |
EMO function | Yes |
Capacity | 15 |
Steps per recipe | 10 recipes |
Auto-Clean Function | Yes |
vibration | < 350um |
Spin speed tolerance | < 10% |
Rotor and bowl material | 316L-EP |
Seal ring material | Viton |
腔体与轴密封类型 | Non-contact Air seal |
Motor type | Brushless Motor. |
N2 heater type | non-contact N2 heater |
Filter precision | 0.003um |
DI and N2 Valve material | PTFE |
Size of tool | 500×695×1820mm |
Weight of tool | 98kgs |