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SRD Spin Rinse Dryer 4in

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spin rinse dryer 4in spin rinse dryer supplier

SRD Spin Rinse Dryer 4in

  • Model Number: XWS-602D-4
  • Max Speed of spin: Up to 2,800rpm
  • With N2 continuous purge. N2 flow can be heated up to 70C
  • With DIW Resistance meter
  • With Anti-Static Device. With N2 Low flow interlock

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Spin Rinse Dryers are designed to remove residual chemicals and particles from wafers while ensuring they are completely dried without leaving water spots. The process typically involves:

Rinsing: Wafers are rinsed with deionized (DI) water to remove any chemical residues or particles.

Drying: The wafers are spun at high speeds (up to 10,000 rpm) while heated nitrogen gas (N2) is injected into the chamber to evaporate moisture quickly and efficiently.

Please check below the data sheet chart of our product:

Technical Data Sheet

Model No. XWS-602D-4
Basic Function DIW Rinse,Pipe Purge,Spin Dry,Hot N2.
Max Speed of spin Up to 2,800rpm
N2 heating 70℃
With N2 continuous purge Yes
DIW Resistance meter Yes
Anti-Static Device/N2 Low flow interlock Yes
EMO function Yes
Capacity 15
Steps per recipe 10 recipes
Auto-Clean Function Yes
vibration < 350um
Spin speed tolerance < 10%
Rotor and bowl material 316L-EP
Seal ring material Viton
腔体与轴密封类型 Non-contact Air seal
Motor type Brushless Motor.
N2 heater type non-contact N2 heater
Filter precision 0.003um
DI and N2 Valve material PTFE
Size of tool 500×695×1820mm
Weight of tool 98kgs